Clean the smallest crevices of implants and completely clean devices without leaving residue behind. Using supercritical CO2 allows you to employ its properties to great benefit:
No surface tension
Carbon Dioxide in its supercritical state has the permeability to reach into the smallest crevices of any implant. Unlike liquids, Supercritical CO2 has no surface tension that would prevent it from reaching all of the crevices and completely cleaning the device. Supercritical CO2 goes deeply into the smallest interstices, and solubilizes impurities, such as paraffin and other binders or lubricants used in the production of the implant.
No residue
Supercritical CO2 does not leave any residue on the implant. CO2 simply evaporates back into the atmosphere, leaving behind no contamination. Unlike solvents there is no residue and no clean-up.
For more information about how supercritical fluid can improve your process, visit the Applied Separations website.
http://appliedseparations.com/Supercritical/
Tuesday, May 25, 2010
Subscribe to:
Post Comments (Atom)
No comments:
Post a Comment