Solvent-Free Critical Cleaning

Clean the smallest crevices of implants and completely clean devices without leaving residue behind. Using supercritical CO₂ allows you to employ its properties to great benefit:

No surface tension
Carbon Dioxide in its supercritical state has the permeability to reach into the smallest crevices of any implant. Unlike liquids, Supercritical CO₂ has no surface tension that would prevent it from reaching all of the crevices and completely cleaning the device. Supercritical CO₂ goes deeply into the smallest interstices, and solubilizes impurities, such as paraffin and other binders or lubricants used in the production of the implant.


No residue
Supercritical CO₂ does not leave any residue on the implant. CO₂ simply evaporates back into the atmosphere, leaving behind no contamination. Unlike solvents there is no residue and no clean-up.


For more information about how supercritical fluid can improve your process, visit the Applied Separations website.


http://appliedseparations.com/Supercritical/